FASH 202 - Computer-Aided Pattern Design

(3 credits)

15 lecture hours; 75 hours combined lecture and laboratory
Prerequisites: FASH 104
Lab fee
Passing this course with a “C” or better fulfills the College’s Computer Literacy Requirement.
The basic methods of developing patterns using the Computer-Aided Drafting and Design (CADD) system are covered. Topics include digitizing, grading, pattern editing, layout, output, individual pattern development, and making monograms and ornaments.